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Seeking advice on ALD testcase results #229

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@GiaBao051203

Hello, I am a working student at Fraunhofer ENAS currently doing a student project. As part of this work, I built a standard test case for an Atomic Layer Deposition (ALD) process.

Geometry: The simulation domain is a closed Lateral High Aspect Ratio (LHAR) cavity with an internal precursor source. The chamber dimensions are 4000 µm in length and 4.5 µm in height (Aspect Ratio $\approx$ 888:1)

I am running a simulation on this test case with varying sticking probabilities ($10^{-1}$ to $10^{-3}$). Based on some research, I expected the thickness curves to roughly overlay on top of each other, differing mostly in their slope or decay length.

However, my simulation results do not match the reference. Instead of overlaying, the profiles drop off sharply and become increasingly noisy.

Could you help me with this problem, give any advice, or help me figure out if I made a mistake?

Thank you!

Image

This is my result

Image

Figure referenced from: K. Arts et al., "Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality," Journal of Vacuum Science & Technology A, 2019. DOI: 10.1116/1.5093620

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