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I added an SF6 - C4F8 model. I think it's a good idea to have it separate rather than using and modifying SF6O2 as I have been till now.
The model might evolve in the future; although the equations are all in psPlasmaEtching and psHBrO2, psSF6O2, psSF6C4F8 just hold their own version of the defaults and which particles types they have (I took the passivation particle out of psSF6C4F8).
Anyway, this will serve my purpose for now.
What do you think?